1200C Three Heating Zone PECVD System
1200C Three Heating Zone PECVD System

1200C Three Heating Zone PECVD System

SK2-CVD-12TPB4 is a tube furnace for PECVD system, consisting of 300W or 500W RF power supply, multi-channel precision flow system, vacuum system, and tube furnace. The commonly used temperature is 1100 degrees Celsius or below, and its main characteristics are low deposition temperature, fast rate, good film quality, fewer pinholes, and less prone to cracking. An ideal device for growing nanowires or preparing various thin films using CVD method.
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Feature

 

● Max temperature RT~1200℃

● Split type of furnace, you can open the furnace.

● Can introduce more than 2 channels of gas, with a vacuum degree of 10Pa using a mechanical pump and a 500W RF power supply to enhance the signal.

● High quality performance alumina ceramic fiber insulation materials

● Temperature control accuracy ±1℃

● With over temperature alarm function

● Cooling fan can reduce the temperature of the casing

 

Model

SK2-CVD-12TPB4

Dimensions: Standard Heating zone length (mm)

440mm

Dimensions: Standard Tube diameter (mm)

∮60mm

Max.temperature

1200℃, Continuous working temperature 1100℃.

Voltage(V)

220 1P

Thermocouple type

K

Heating element

HRE Alloy resistance wire

Temp.Precision

±1℃

Heating rate

0-30℃/min free adjustment

Chamber material

Using advanced high-quality alumina microcrystalline fiber material

Furnace structure

Double-layer air-cooled structure, surface temperature is less than 60℃

Temperature controller

Intelligent PID temperature control instrument, 30 program segments, SSR control, PID parameter self-tuning function; program temperature rise, program heat preservation, program cooling

500W RF power supply

Output power: 5-500W ±1°C

RF frequency: 13.56MHz ±0.005%

Reflected power: up to 100W

Match: Automatic

RF interface: 50Ω, N-type

Cooling: air cooling

Power supply: AC 208-240V, 50/60HZ

4 gas channel precision flow system

1. Full scale flow rate(5, 10, 30, 50, 100, 200, 300, 500)ML/min. 10L/min.

2. Valve type: Solenold valve.

3. Valve rest position: Normally close.

4. Differential pressure: (50-300)kpa

5. Pressure resistance: 3mpa.

6. Operation temperature: 5-45℃

7. Materials: stainless steel 316L.

Vacuum system

5*10-3Pa

KF25 quick connect, stainless steel bellows, manual flapper valve and flange, vacuum pum

Higher vacuum systems can also be optionally equipped.

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WELCOME OEM/ODM

 

Standard Accessories

 

Thermal gloves | Crucible hook | Thermocouple | Tube Block | User Manual |Tools | Vacuum pump| Quartz tube |Flange |Sealing ring |10mm gas hose |Flange support, Gas system, RF power.

 

Optional

 

Different heating zone for your choose;

LCD touch screen control for choose

RS485/USB port to connect computer for choose.

 

Detail picture for CVD-PECVD

 

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500W RF power supply
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Vacuum system
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4 gas channel precision flow system

 

Application

 

This device is mainly used for growing nanowires or preparing various thin film growth using CVD method.

 

Warranty

 

One year warranty and lifelong technical support

Special tips:

1. Consumables such as heating element, quartz tube, sample crucible, etc. are not within the warranty period.

2. Damage caused by the use of corrosive gas and acid gas is not covered by the warranty.

 

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